Model: Xtrim-FC-A300

  • The Xtrim-FC-A300 is a fully automated FOUP/FOSB cleaning system designed for high-volume semiconductor production environments. Engineered for superior cleanliness, fast throughput, and safety compliance, it ensures contamination-free wafer transport throughout the fab.
Equipment Structure 1 Loader, 2 Unloaders 3 Buffer Stages 3 Clean Chambers 3 Vacuum Chambers Robotic Handling
Key Features Fully Automated Process High Compatibility SEMI S2 / F47 Certified Superior Process Control High Throughput

Core Capabilities

  • Fully Automated Workflow
    • Automated lid opening/closing, internal cleaning, vacuum drying, and dehumidification
    • Consistent operation without manual intervention
  • Broad Compatibility
    • Supports multiple FOUP/FOSB formats without the need for mechanical changes
    • Simple integration into various fab logistics workflows
  • Safety & Compliance
    • Certified to SEMI S2 and F47 standards
    • Designed with comprehensive interlocks and error-prevention protocols
  • High-Performance Cleaning
    • Efficient removal of particles, AMCs (including VOCs), and outgassing residue
    • Integrated N₂ purge maintains low humidity inside FOUPs post-clean
  • High Throughput
    • Capable of processing 25–30 containers per hour
    • Optimized chamber cycle times and robot coordination maximize efficiency
Semi FOUP Cleaner

Model: Xtrim-FC-M300

  • The Xtrim-FC-M300 is a semi-automatic FOUP/FOSB cleaning system designed for fabs, research facilities, and support areas that require reliable cleaning with greater operational flexibility. Engineered for process performance, equipment safety, and cost-efficiency, the M300 offers configurable options to handle a wide range of wafer transport containers and accessories.
Wafer Size Support Cycle Time Drying Methods Certifications Compatibility
4" to 12" 30–60 mins/cycle Hot Air / Infrared Drying SEMI S2 / F47 Certified FOUP, FOSB, mask boxes, cassettes, etc.

Core Capabilities

  • High Cleaning Efficiency
    • Combines pure water heating, high-pressure spray, high-speed centrifugal dewatering, CDA/N₂ purging, and hot air/infrared drying for complete container cleaning and drying
  • Broad Container Compatibility
    • Supports FOUPs, FOSBs, wafer cassettes, mask boxes, and custom carriers from 4″ to 12″
  • Safety-Driven Design
    • Equipped with: DBPS dynamic balance protection, High-temperature interlock control, Foolproof protection systems for operator and system safety
  • Flexible Chamber Configuration
    • Cleaning chamber accommodates 4 or 6 FOUPs per cycle
    • Chamber layout is customizable based on user requirements and space constraints
  • Optimized for Cost & Performance
    • Ideal for mid-volume cleaning needs, pilot lines, and tool maintenance operations
    • Delivers cleanliness levels compliant with front-end semiconductor requirements at a lower footprint and cost
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